Capabilities
CXRO operates unique instruments and facilities at the Advanced Light Source, providing researchers access to world-leading EUV and X-ray capabilities.
MET5
The Micro-Exposure Tool — a 0.3-NA EUV lithography system for photoresist evaluation and patterning research.
SHARP
Synchrotron-based actinic EUV photomask review and inspection at the ALS.
Nanofabrication
World-class nanofabrication capabilities including zone plate optics, diffractive elements, and nanostructures.
Reflectometry / Scatterometry
EUV and soft X-ray reflectometry for characterizing thin films, multilayers, and optical constants.
RSoXS
Resonant soft X-ray scattering for nanoscale morphology and critical-dimension metrology of polymers and patterned films.
Optical Coatings
Design, deposition, and characterization of multilayer and thin-film coatings for EUV and X-ray optics.
Precision Engineering
Mechanical, electrical, and vacuum engineering supporting instrument design and beamline development.
PES / TEY / FTIR / EAL
Photoemission Spectroscopy, Total Electron Yield, Fourier Transform Infrared Spectroscopy, and Electron Analysis Laboratory capabilities.