ANGEL
Accelerating the Next-Generation of EUV Lithography
The ANGEL project is part of the Extreme Lithography & Materials Innovation Center (ELMIC), a Microelectronics Science Research Center (MSRC) funded by the U.S. Department of Energy.
ANGEL investigates methods for controlling the radiation transport properties of laser-produced plasma to improve the efficiency and power of EUV sources, and to reveal and control the atomic-scale processes of mirror degradation by EUV plasma ejecta and secondary hydrogen plasma.





