The Center for X-Ray Optics is a multi-disciplined research group within Lawrence Berkeley National Laboratory's (LBNL) Materials Sciences Division (MSD). Notice to users.
Precision Engineering
Building the tools that make nanoscience possible.
Zone plates
Diffractive lenses for a new generation of x-ray beamlines.
Interferometry
Wavefront control with
sub-angstrom sensitivity
Optical Coatings
Precision optical coatings for soft
x-ray and EUV applications worldwide.
EUV Lithography
The world's highest resolution projection lithograph tool.
EUV Mask Imaging
The world's highest performance
EUV mask inspection tool.
Reflectometry
The world standard for EUV and
x-ray reflectance measurements.
Holography
Systematically controlling spatial
and temporal coherence in short wavelength optical systems.
Education
Inspiring and preparing the next generation of scientists, engineers,
and educators.
Nanomagnetism
High resolution imaging of nanoscale magnetic stcutrures.
Careers
Exciting opportunities in optics, engineering, and nanofabrication.
The Center for X-Ray Optics
Lawrence Berkeley National Laboratory's Center for X-Ray Optics works to further science and technology using short wavelength optical systems and techniques. We create and operate advanced experimental systems to address national needs, support research in material, life, and environmental science, and extend the forefront of semiconductor manufacturing.
News
Partnership for Progress in Electronics Strengthened by New Lab-Industry Investment
Leading semiconductor and emerging-technology firms have recently renewed their long collaboration with the U.S. Department of Energy’s Lawrence Berkeley National Laboratory (Berkeley Lab) to build facilities and instruments for advanced extreme-ultraviolet lithography (EUVL), including microlithography test tools too costly for individual manufacturers.
Since the early 2000s, Berkeley Lab’s Center for X‑Ray Optics (CXRO) has worked with semiconductor companies to develop the infrastructure needed for world-leading research and development in the field of EUVL, contributing basic research and development essential to the health of the U.S. industry as a whole before individual firms enter competition.
“The MET5 will be a unique instrument with double the effective resolution of the best tools now in commercial use,” says CXRO’s director, Patrick Naulleau, a staff scientist in the Lab’s Materials Sciences Division. “MET5 and the new wafer-processing facility at ALS Beamline 12 will allow us to develop and test photosensitive materials capable of transferring patterns on the nanoscale, the future domain of semiconductor lithography technology.”
For more information check out the article "Partnership for Progress in Electronics Strengthened by New Lab-Industry Investment".
"The Center for X-Ray Optics is a one of a kind facility with over 25 years of experience providing short wavelength optical solutions. From instrument development to scientific discovery, our vertically integrated structure allows us to tackle a full spectrum of research."
Patrick Naulleau
CXRO Director
