Welcome to CXRO!

The Center for X-Ray Optics (CXRO) is a facility within the Materials Science Division at Lawrence Berkeley National Laboratory dedicated to advancing the science and technology of short-wave optical systems, including extreme ultraviolet (EUV) and soft x-ray radiation.

CXRO scientists participate in the MSD research programs of Condensed Matter and Materials Sciences. Major areas of interest at CXRO include: nanostructure fabrication; x-ray interactions with matter; x-ray microscopy; EUV photoresists and mask defect analysis; and novel diffractive optics. CXRO pursues a broad range of projects and develops new instrumentation to address national needs and technical challenges that impact materials, life, environmental sciences, and x-ray optics.

Please browse the menu at the left side of the screen to view further information about us. There is quite a lot of information under the Research, Beamlines and Endstations, and Laboratories topics, and the famous X-Ray Interactions With Matter calculator is available. You may also browse and search our Publications database. If you would like more information, see our general contact information or, to contact individuals, see our Personnel list.

Research Highlights

Read about some of our world-leading research endeavors here:

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Direct Observation of Stochastic Domain-Wall Depinning in Magnetic Nanowires

http://cxro.lbl.gov/system/files/highlight_images/Depinning.thumbnail.jpgNovel concepts for magnetic data storage are based on a precise and repeatable movement of magnetic domain walls in magnetic nanowires.

Time Resolved X-ray Microscopy Reveals the Strength of Spin Torque

http://cxro.lbl.gov/system/files/highlight_images/video_small.thumbnail.jpgTime-resolved high resolution magnetic soft X-ray microscopy of current induced resonant vortex core motion in a 1.5micrometer small permalloy (Fe80Ni20) disk allows the unambiguous determination of the spin polarization of current.

EUV Photoresist Sensitivity Calibrations

http://cxro.lbl.gov/system/files/highlight_images/dose-calibration.thumbnail.pngAbsolute resist calibration measurements done using the CXRO Calibrations and Standards Beamline and the CXRO EUV Microfield Exposure Tool have revealed that EUV resist are twice as fast as previously thought. These results apply to essentially all EUV photoresist and all EUV tools in the world.

Novel Diffractive Optics Research

http://cxro.lbl.gov/system/files/highlight_images/spiral_zoneplate_charge2.thumbnail.pngSpecialized diffractive optical elements are being developed to improve contrast and resolution for imaging studies in the soft x-ray region. This research involves the Coherent Optics Beamline and the Nanofabrication Laboratory, and is described in more detail on the Specialized Diffractive Optics page.

Soft X-ray Microscopy of Spin Current Domain Wall Movements in a Ferromagnetic Nanowire

http://cxro.lbl.gov/system/files/highlight_images/spin-current-induced-domain-wall-movement.thumbnail.pngThe stochastic character of spin current induced domain wall movement in curved permalloy wires is visualized by high resolution magnetic transmission x-ray microscopy at BL 6.1.2. For details see G. Meier et al. Phys. Rev. Lett. 98, 187202 (2007).

World Record in Soft X-ray Microscopy

http://cxro.lbl.gov/system/files/highlight_images/fifteen-nm-xm1.thumbnail.jpgProgress in Soft X-Ray Microscopy at a spatial resolution better than 15nm has been recently published in Nature. The microscope at Beamline 6.1.2 was used to collect images, and the optics were made in the Nanofabrication Laboratory.

R&D 100 Award 2008

http://cxro.lbl.gov/system/files/highlight_images/RandD_100_CSU_ALI3544.thumbnail.jpgR&D Magazine has announced its 100 awards for top research and development projects, and CXRO is once again featured.

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