The Center for X-Ray Optics is a multi-disciplined research group within Lawrence Berkeley National Laboratory's (LBNL) Materials Sciences Division (MSD). Notice to users.
Precision Engineering
Building the tools that make nanoscience possible.
Zone plates
Diffractive lenses for a new generation of x-ray beamlines.
Interferometry
Wavefront control with
sub-angstrom sensitivity
Optical Coatings
Precision optical coatings for soft
x-ray and EUV applications worldwide.
EUV Lithography
The world's highest resolution projection lithograph tool.
EUV Mask Imaging
The world's highest performance
EUV mask inspection tool.
Reflectometry
The world standard for EUV and
x-ray reflectance measurements.
Holography
Systematically controlling spatial
and temporal coherence in short wavelength optical systems.
Education
Inspiring and preparing the next generation of scientists, engineers,
and educators.
Nanomagnetism
High resolution imaging of nanoscale magnetic stcutrures.
Careers
Exciting opportunities in optics, engineering, and nanofabrication.
The Center for X-Ray Optics
Lawrence Berkeley National Laboratory's Center for X-Ray Optics works to further science and technology using short wavelength optical systems and techniques. We create and operate advanced experimental systems to address national needs, support research in material, life, and environmental science, and extend the forefront of semiconductor manufacturing.
News
Industry funds development of new world-leading full field EUV microscope at CXRO
The Center for X-Ray Optics (CXRO/MSD) at Lawrence Berkeley National Laboratory, in partnership with a consortium of leading semiconductor industry companies, is poised to create the world’s most advanced extreme ultraviolet (EUV) microscope.
This revolutionary imaging tool will be dedicated to photolithography research: photolithography is the central process in the creation of computer chips. The new microscope will replace ageing infrastructure on ALS Beamline 11.3.2 and give the semiconductor industry a nano-scale view into chip making processes in the 16,- 11-, and 8-nm device sizes, for the next decade and beyond of computer memory and microprocessor development.
Years ahead of commercialization, research consortia formed from leading semiconductor companies cooperatively fund the development of chip-making technology. This 1.5-year, $4.1M project will take place in parallel with ongoing operations of the existing EUV microscope, ultimately replacing it and beginning full operations in 2013. The new microscope will reproduce the properties of current and future lithography production and development tools, giving researchers the most advanced look at what’s to come.
For more information check out the article "Sematech Funds Actinic Microscope for EUV Masks".
"The Center for X-Ray Optics is a one of a kind facility with over 25 years of experience providing short wavelength optical solutions. From instrument development to scientific discovery, our vertically integrated structure allows us to tackle a full spectrum of research."
Patrick Naulleau
CXRO Director
