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The Center for X-Ray Optics is a multi-disciplined research group within Lawrence Berkeley National Laboratory's (LBNL) Materials Sciences Division (MSD). Notice to users.

The Center for X-Ray Optics

The Center for X-Ray Optics at Lawrence Berkeley National Laboratory works to further science and technology using short wavelength optical systems and techniques. We create and operate advanced experimental systems to address national needs, support research in material, life, and environmental science, and extend the forefront of semiconductor manufacturing.

"CXRO is a one-of-a-kind facility with over 25 years of experience providing short wavelength optical solutions. From instrument development to scientific discovery, our vertically integrated structure allows us to tackle a full spectrum of research."

Patrick Naulleau
CXRO Director

Photo of Patrick Naulleau, CXRO Staff Scientist
News

CXRO helps develop the world's first scanning EUV mask imaging microscope

CXRO has partnered with Samsung to develop the world's first scanning EUV mask imaging microscope. The instrument, integrated by Samsung, uses a commercial high-harmonic generation light source and is now operational in an industrial setting. CXRO's role included system specification as well as design and implementation of the system's diffraction limited optics and detector module. The optics module includes several key new developments: a single harmonic selecting multilayer turning mirror, elliptical zoneplate for off axis operation, a micro-fabricated integrated order sorting aperture, and low-noise detector / electronics hardware for single laser pulse detection per scan point. CXRO also developed controls and image processing algorithms to enable an image reconstruction accuracy in the single digit nm regime.

SEM image of EUV mask with defect

Left: scanning electron microscope (SEM) image of an EUV mask with a defect. Middle: SEM image of printed EUV wafer in the region of the mask defect. Right: actinic image of the mask image taken with the new microscope shows the phase defect printability on the wafer is reproduced successfully in the actinic image.

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